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Low-voltage high-performance C60 thin film transistors via low-surface-energy phosphonic acid monolayer/hafnium oxide hybrid dielectric

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4 Author(s)
Acton, Orb ; Department of Materials Science and Engineering, University of Washington, Box 352120, Seattle, Washington 98195, USA ; Ting, Guy ; Ma, Hong ; Jen, Alex K.-Y.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2975175 

C60-based organic thin film transistors (OTFTs) have been fabricated using a n-octadecylphosphonic acid self-assembled monolayer/sol-gel processed hafnium oxide hybrid dielectric. With the combination of high capacitance (580 nF/cm2) and low leakage current density (8×10-9A/cm2), this hybrid dielectric yields C60 OTFTs operating under 1.5 V with an average n-channel saturation field-effect mobility of 0.28 cm2/Vs, high on-off current ratio of 105, and low subthreshold slope of 100 mV/decade. The low surface energy of the n-octadecylphosphonic acid allows C60 to form a thin film with large grains that provide an efficient charge carrier pathway for the low-voltage OTFTs.

Published in:
Applied Physics Letters  (Volume:93 ,  Issue: 8 )

Date of Publication: Aug 2008

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