Cart (Loading....) | Create Account
Close category search window
 

Influence of interface roughness on the performance of nanoparticulate zinc oxide field-effect transistors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Okamura, Koshi ; Institute of Nanotechnology, Forschungszentrum Karlsruhe, 76021 Karlsruhe, Germany ; Mechau, Norman ; Nikolova, Donna ; Hahn, Horst

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2972121 

Nanoparticulate zinc oxide is regarded as one of the most promising inorganic materials for printable field-effect transistors (FETs), which work in the n-channel enhancement mode, due to the compatibility with solution, low-temperature, and high throughput processes. Since nanoparticulate films are composed of the nanoparticles and their agglomerates, the roughness of the interface to the insulating layer, where the channel of the FETs is formed, is a critical issue. Thus, the influence of the interface roughness on the field-effect mobility of the FETs is investigated in conjunction with film roughness and capacitance analyses. The field-effect mobility increases almost by a factor of 50, from 2.0×10-4 to 8.4×10-3 cm2V-1s-1, even if the reduction in the average roughness of the films is as small as 1.7 nm.

Published in:

Applied Physics Letters  (Volume:93 ,  Issue: 8 )

Date of Publication:

Aug 2008

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.