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Growth and structural characterization of (0.2)Bi(Zn1/2Ti1/2)O3–(0.8)PbTiO3 epitaxial thin films by off-axis rf sputtering

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4 Author(s)
Kwon, Daeyoung ; Department of Physics and Research Center for Dielectric and Advanced Matter Physics, Pusan National University, Busan 609-735, Republic of Korea ; Kim, Bongju ; Tong, P. ; Kim, Bog G.

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We report the epitaxial growth of ferroelectric (0.2)Bi(Zn1/2Ti1/2)O3–(0.8)PbTiO3 thin films. Despite its high c/a ratio, the off-axis rf magnetron sputtering yields the epitaxial growth of high-quality thin films on (001) SrTiO3 substrates. The structural development of the film with increasing film thickness has been examined by using the synchrotron x-ray diffraction and x-ray reflectivity. The experimental results can be explained in terms of the strain relaxation process associated with the misfit dislocations between the thin film and the substrate.

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Applied Physics Letters  (Volume:93 ,  Issue: 4 )