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Three photon absorption in silicon for 2300–3300 nm

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3 Author(s)
Pearl, Shaul ; Department of Physics and Institute for Optical Sciences, University of Toronto, Toronto M5S-1A7, Canada ; Rotenberg, N. ; van Driel, H.M.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2991446 

We measure the spectral dependence of the degenerate three photon absorption coefficient, γ, for a Si [100] wafer using 200 fs pulses in the range 2300–3300 nm, i.e., photon energy between half and one-third the indirect band gap. For pulses linearly polarized along the [001] crystal axis γ increases from a value of near 0 cm3/GW2 at 3300 nm to a peak value of 0.035 cm3/GW2 at 2700 nm before decreasing with shorter wavelength; this is consistent with the dispersion expected from allowed-allowed-allowed transitions. At 2600 nm the γ value is ∼30% larger for light polarized along [011] than along [001].

Published in:
Applied Physics Letters  (Volume:93 ,  Issue: 13 )

Date of Publication: Sep 2008

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