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Grain size reduction for perpendicular magnetic recording media using an Ar-ion etched Ru seedlayer

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2 Author(s)
Yuan, Hua ; Data Storage Systems Center, Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA ; Laughlin, D.E.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2979685 

We report an approach to reduce grain size for perpendicular media by using an Ar-ion etched Ru seedlayer. The surface etching affects the microstructure of the subsequent high pressure deposited Ru2+SiO2 interlayer and magnetic layer, whose grain size can be controlled. SiO2 in the interlayer plays a more important role in grain size reduction on the etched seedlayer than the as-grown seedlayer. Small Ru2 grains ∼3.9 nm and magnetic grains ∼5.3 nm with uniform distribution have been obtained. Thinner Ru grain boundaries with reduced size could be the cause of nonideal one-to-one grain growth and degraded magnetic properties.

Published in:

Applied Physics Letters  (Volume:93 ,  Issue: 10 )

Date of Publication:

Sep 2008

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