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Nonequilibrium atmospheric pressure plasma with ultrahigh electron density and high performance for glass surface cleaning

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7 Author(s)
Iwasaki, Masahiro ; Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan ; Inui, Hirotoshi ; Matsudaira, Yuto ; Kano, Hiroyuki
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We produced a nonequilibrium atmospheric pressure plasma by applying an alternative current between two electrodes. The gas temperature and electron density were evaluated using optical emission spectroscopy. It was found that the plasma had gas temperatures from 1800 to 2150 K and ultrahigh electron densities in the order of 1016 cm-3. A remarkably high oxygen radical concentration of 1.6×1015 cm-3 was obtained at a 1% O2/Ar gas flow rate of 15 slm (standard liters per minute). Contact angles below 10° were obtained in the process of glass cleaning with a plasma exposure time of 23 ms.

Published in:

Applied Physics Letters  (Volume:92 ,  Issue: 8 )

Date of Publication:

Feb 2008

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