IEEE.org| IEEE Xplore Digital Library| IEEE Standards| IEEE Spectrum| More Sites

Cart (Loading....) | Create Account | 

Close category search window
Author Searchbeta |  Advanced Search  |  Preferences |  Search Tips  |  More Search Options  
 
Browse Journals & Magazines > Applied Physics Letters ...> Volume:92 Issue:22 Help

Tuning the Schottky barrier height of nickel silicide on p-silicon by aluminum segregation

Full Text Sign-In or Purchase

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing! close button
puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Sinha, M. ; Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576, Singapore ; Eng Fong Chor ; Yee-Chia Yeo

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2940596 

We report the Schottky barrier height (SBH) tuning at the nickel silicide (NiSi)/p-Si junction by the introduction of aluminum (Al) using ion implantation and its segregation after silicidation. The SBH for holes has been found to decrease with increasing concentration of Al at the NiSi/p-Si interface. We demonstrate the achievement of one of the lowest reported SBH for holes of 0.12 eV, with less than 0.1 at. % Al in NiSi, which is promising for application in p-channel Schottky source/drain transistors.

Published in:
Applied Physics Letters  (Volume:92 ,  Issue: 22 )

Date of Publication: Jun 2008

Page(s):
222114 - 222114-3
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.2940596
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Jun 2008

IEEE Account

Purchase Details

Profile Information

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.