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Nanoscale thick layer transfer of hydrogen-implanted wafer by using polycrystalline silicon sacrificial layer

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5 Author(s)
Lee, T.-H. ; Department of Mechanical Engineering, National Central University, Chung-Li, Taiwan 32054, Taiwan ; Huang, C.-H. ; Yang, Y.Y. ; Suryasindhu, T.
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This article presents a sacrificial layer method of forming a nanoscale thick silicon-on-insulator thin film, avoiding the channeling effect of implantation and eliminating a subsequent thinning process. However, because of the light mass of hydrogen, it is difficult with the implantation technique to have a shallow implant depth for splitting a layer at a thickness less than 100 nm by a traditional Smart-Cut® process. This study proves that using a polycrystalline-Si layer as a sacrificial layer in the initial implantation step can easily define a silicon transfer layer down to a thickness of tens of nanometers.

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Applied Physics Letters  (Volume:91 ,  Issue: 20 )