By Topic

Substrate heating influence on plume propagation during pulsed laser deposition of complex oxides

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Sambri, A. ; Coherentia CNR-INFM and Dipartimento di Scienze Fisiche, Università degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli, Italy ; Amoruso, S. ; Wang, X. ; Radovic, M.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2795792 

We investigate the effects of the substrate-heater temperature on the expansion dynamics of laser plumes of complex oxides in oxygen atmosphere. We observed a considerable reduction of the background gas resistance to plume propagation as the substrate temperature was increased, leading to a remarkable change in the velocity of the species impacting the substrate during film growth. The deposition temperature thus influences film growth not only through its direct thermal effect on surface kinetics of adatoms, but also by affecting the energetic properties of the precursors in the gas phase. We interpret the results with a simplified model of plume front propagation, accounting for the change in the background gas density induced by the substrate temperature.

Published in:

Applied Physics Letters  (Volume:91 ,  Issue: 15 )