Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.
Published in:
Applied Physics Letters
(Volume:91
,
Issue:
14
)
Date of Publication:
Oct 2007
- Page(s):
-
143110
-
143110-3
- ISSN :
-
0003-6951
- Digital Object Identifier :
-
10.1063/1.2794010
- Date of Current Version :
-
18 June 2009
- Issue Date :
-
Oct 2007