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Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers

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6 Author(s)
Stabile, R. ; National Nanotechnology Laboratory (NNL) of INFM-CNR, c/o Dipartimento di Ingegneria dell’Innovazione and Distretto Tecnologico ISUFI, Università del Salento, via Arnesano, I-73100 Lecce, Italy ; Camposeo, Andrea ; Persano, Luana ; Tavazzi, S.
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The authors demonstrate direct electron-beam writing on conjugated polymers as patterning route to realize plastic optoelectronic devices. Lithography was carried out by a 20 kV electron beam dose in the range of 0–360 μC/cm2, with no need for masking or development/etching processes. The features could be employed for the fabrication of polymer distributed feedback lasers, exhibiting optically pumped lasing in the range of 607–620 nm, with a spectral linewidth around 1 nm and a threshold excitation fluence of 34 μJ/cm2.

Published in:

Applied Physics Letters  (Volume:91 ,  Issue: 10 )