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Large flexible nanowire grid visible polarizer made by nanoimprint lithography

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7 Author(s)
Chen, Lei ; NanoOpto Corporation, 1600 Cottontail Lane, Somerset, New Jersey 08873 ; Wang, Jian Jim ; Walters, Frank ; Deng, Xuegong
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2472532 

117 and 150 nm pitch polymer gratings were successfully fabricated on plastic substrate over large area by nanoimprint lithography. Nanowire-grid polarizers were made by depositing Al on the sidewalls of the gratings at oblique angles. The effects of grating period, grating linewidth, Al depth, and thickness were studied in detail. Excellent contrast (∼1000:1) and high transmittance (80%–90%) (without antireflection coating) at the wavelength of 500 nm and above were demonstrated.

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Applied Physics Letters  (Volume:90 ,  Issue: 6 )