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High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids

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5 Author(s)
Wang, Jian Jim ; NanoOpto Corporation, 1600 Cottontail Lane, New Jersey 08873-5115 ; Walters, Frank ; Liu, Xiaoming ; Sciortino, Paul
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2437731 

Large-area, 100 mm in diameter, aluminum nanowire grids with 40 nm line/78 nm space were fabricated with full-wafer immersion interference lithography. The aluminum nanowire grids with a 59 nm half-pitch work as a highly efficient optical polarizer for deep ultraviolet wavelength down to ∼250 nm. In addition, an extremely high contrast from 10 000:1 to 50 000:1 was achieved across the whole visible and near-infrared wavelength range, along with good transmittance (85%–90%). The broadband large-area high-performance polarizer operating down to deep ultraviolet wavelength opens up applications including semiconductor lithography and metrology applications.

Published in:

Applied Physics Letters  (Volume:90 ,  Issue: 6 )