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Efficient focusing of hard x rays to 25 nm by a total reflection mirror

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11 Author(s)
Mimura, Hidekazu ; Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan ; Yumoto, Hirokatsu ; Matsuyama, Satoshi ; Sano, Yasuhisa
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Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km-long beamline of SPring-8.

Published in:

Applied Physics Letters  (Volume:90 ,  Issue: 5 )

Date of Publication:

Jan 2007

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