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Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling

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4 Author(s)
Cui, Bo ; NanoStructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544 ; Yu, Zhaoning ; Ge, Haixiong ; Chou, S.Y.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2390652 

The authors have developed an approach to fabricate large area 50 nm period gratings (22 nm linewidth) with low cost. The method used a fabrication cycle twice, each combining nanoimprint lithography with a spatial frequency doubling based on electroless plating, lift-off, and reactive ion etching. Hence by frequency doubling twice, we started with a 200 nm period grating mold and finished with a 50 nm period grating with a uniform area of 3 cm2—the largest achieved today. This method is scalable for the fabrication of even smaller period gratings over a large area, and is a viable low-cost technique for making nanoimprint lithography molds for high-throughput fabrication of 50 nm period grating or grid devices.

Published in:

Applied Physics Letters  (Volume:90 ,  Issue: 4 )

Date of Publication:

Jan 2007

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