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Patterning of indium tin oxide by projection photoablation and lift-off process for fabrication of flat-panel displays

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3 Author(s)
Chae, Junghun ; Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 ; Appasamy, Sreeram ; Jain, Kanti

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Indium tin oxide (ITO), an important material used as a transparent conductive oxide in thin-film transistor liquid-crystal display fabrication, was patterned by a nonlithographic process. First, a Si3N4 substrate coated with photoresist was patterned by a projection photoablation process using 248 nm wavelength KrF excimer laser radiation. ITO was then deposited by sputtering and patterned by lift-off. The resulting ITO pattern was clean even though it was patterned without the conventional steps of photoresist development and ITO etching. This process technology provides a faster and more economical patterning capability compared to conventional photolithography and etch processes used in the display industry.

Published in:

Applied Physics Letters  (Volume:90 ,  Issue: 26 )

Date of Publication:

Jun 2007

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