Close category search window
 

Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Jo, Gunho ; Department of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea ; Maeng, Jongsun ; Kim, Tae-Wook ; Hong, Woong-Ki
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2728754 

Scaling effects of In2O3 nanowire field effect transistors (FETs) were examined as a function of channel length. The channel length was varied from 1 μm to 20 nm by placing a conducting atomic force microscope tip on the In2O3 nanowire as a movable contact. The In2O3 nanowire FET exhibited a variety of channel-length dependent transfer characteristics in terms of the source-drain current, transconductance, threshold voltage, and mobility. Furthermore, the authors were able to extract the contact resistance and distinguish between apparent mobility and intrinsic mobility. The latter was corrected, taking into account the non-negligible contact resistance for short channel devices.

Published in:
Applied Physics Letters  (Volume:90 ,  Issue: 17 )

Date of Publication: Apr 2007

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.