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Scanning Kelvin probe microscopy is widely used to measure surface work functions and electrostatic potentials. However, its measurement accuracy suffers from a cantilever effect. The authors introduce a surface potential shield with aperture structure to eliminate cantilever effect. By varying dc biases on the shield, the strength of cantilever effect is deliberately moderated and linear regression can be used to extract the true surface potential. Experimental results show that this approach yields accurate potential measurement, especially when there is only a single potential domain within aperture. A mobile potential shield structure mounted on a micromanipulator can make this approach more versatile.