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Universal approach to accurate resistivity measurement for a single nanowire: Theory and application

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3 Author(s)
Gu, Wenhua ; Thin Film and Charged Particle Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801; Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801; and Center for Nano Science and Technology, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 ; Hyungsoo Choi ; Kyekyoon Kim

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2405400 

A universal four-contact method is proposed to accurately determine the resistivity of a single nanowire and other nanostructures. Unlike the conventional four-contact method or two-contact method, the present scheme does not require nonrectifying (Ohmic) contacts to the nanowire and can completely eliminate the systematic error resulting from the contact resistance or the resistance difference between the contacts. The present method has been applied to copper nanowire and can be used as a universal resistivity measurement scheme for all nanowires and other nanostructures.

Published in:

Applied Physics Letters  (Volume:89 ,  Issue: 25 )

Date of Publication:

Dec 2006

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