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Combinatorial-mold imprint lithography: A versatile technique for fabrication of three-dimensional polymer structures

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3 Author(s)
Low, Hong Yee ; Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602, Singapore ; Zhao, Wei ; Dumond, Jarrett

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2219148 

A two-step fabrication technique based on nanoimprint lithography is described for the fabrication of three-dimensional micro- and nanostructures. By combining simple two-dimensional geometries from two molds, complex and useful three-dimensional structures are obtained. The careful selection of mold geometries constitutes a simplified and efficient approach toward building up desirable three-dimensional structures without resorting to the use of a sacrificial process or components. Three-dimensional structures fabricated for a variety of specific applications are presented using both thermoplastic and cross-linked polymer materials.

Published in:

Applied Physics Letters  (Volume:89 ,  Issue: 2 )

Date of Publication:

Jul 2006

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