By Topic

Compositional and structural changes in LiNbO3 following deep He+ ion implantation for film exfoliation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

10 Author(s)
Roth, Ryan M. ; Microelectronic Sciences Laboratory, Columbia University, New York, New York 10027 ; Djukic, Djordje ; Lee, Yoo Seung ; Osgood, R.M.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2352798 

The physical mechanism of He-ion-based exfoliation in Z-cut LiNbO3 is investigated. Rutherford backscattering/channeling, nuclear-reaction analysis, and transmission electron microscopy are used to examine the compositional and structural changes caused by deep ion implantation followed by thermal annealing. Lattice disruption, He-bubble formation, and Li depletion are observed in the implantation region, as well as the onset of exfoliation. The implications of these observations for the crystal ion slicing method are discussed.

Published in:

Applied Physics Letters  (Volume:89 ,  Issue: 11 )