Cart (Loading....) | Create Account
Close category search window
 

Minute doping with deleterious rare earths in YBa2Cu3O7-δ films for flux pinning enhancements

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Barnes, P.N. ; Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7919 ; Kell, J.W. ; Harrison, B.C. ; Haugan, T.J.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2219391 

To enhance the critical current density of YBa2Cu3O7-δ films, flux pinning centers are intentionally added to inhibit flux flow in applied magnetic fields. Here we provide an initial demonstration that the incorporation of very minor additions (≤1% of Y as opposed to the 10%–40% in standard substitutions) of typically deleterious rare earths into high quality YBa2Cu3O7-δ thin films provides significant improvement of the film’s in-field current density. This is accomplished without reoptimization of the deposition parameters. Instead of site substitution for Y as might be expected, the deleterious rare earths potentially result in the formation of nanoparticulates.

Published in:

Applied Physics Letters  (Volume:89 ,  Issue: 1 )

Date of Publication:

Jul 2006

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.