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Formation of nanoporous noble metal thin films by electrochemical dealloying of PtxSi1-x

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8 Author(s)
Thorp, J.C. ; Department of Chemical and Materials Engineering, Arizona State University, Tempe, Arizona 85287 ; Sieradzki, K. ; Tang, Lei ; Crozier, P.A.
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We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous PtxSi1-x films (∼100–250 nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 5–20 nm, ligament thickness ∼5 nm, a surface area enhancements ≫20 times, and an ultrafine grain polycrystalline microstructure.

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Applied Physics Letters  (Volume:88 ,  Issue: 3 )