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Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy

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6 Author(s)
Booth, Jean-Paul ; Laboratoire de Physique et Technologie des Plasmas, CNRS UMR 7648, Ecole Polytechnique, 91128 Palaiseau, France ; Corr, Cormac S. ; Curley, Garrett A. ; Jolly, Jacques
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F- negative ions were detected by direct observation of the weak photodetachment absorption continuum below 364.5 nm by cavity ring-down spectroscopy. The negative ions were generated in a modified industrial dielectric plasma etch reactor, with 2+27 MHz dual frequency capacitive excitation in Ar/CF4/O2 and Ar/C4F8/O2 gas mixtures. The F- signal was superimposed on an unidentified absorption continuum, which was diminished by O2 addition. The F- densities were in the range of (0.5–3)×1011 cm-3, and were not significantly different for single (27 MHz) or dual (2+27 MHz) frequency excitation, not confirming recent modeling predictions.

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Applied Physics Letters  (Volume:88 ,  Issue: 15 )