Cart (Loading....) | Create Account
Close category search window
 

Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Heon Lee ; Department of Materials Science and Engineering, Korea University, 1, 5ka, Anam-dong, Sungbuk-ku, Seoul 136-701, Korea ; Hong, Sunghoon ; Yang, Kiyeon ; Choi, Kyungwoo

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.2193653 

Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120 °C can be another problem. In this study, 100 nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid phase resin and thus patterns can be fabricated without residual layer at room temperature and at much lower pressure (≪3–5 atm) with UV illumination. No degradation of PET film was observed due to the imprint process and, as a result, 100 nm sized TiAu metal patterns were successfully formed on PET film using UV curing imprint lithography and lift-off process.

Published in:

Applied Physics Letters  (Volume:88 ,  Issue: 14 )

Date of Publication:

Apr 2006

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.