Polycrystalline silicon (p-Si) is a good material for the construction of thin-film transistors (TFT). It is used for fabricating active-matrix organic light-emitting diode (AMOLED) displays. In this letter, we propose and demonstrate the application of boron-doped p-Si as a semi-transparent anode in making different color OLEDs. Without removing the ultrathin native oxide on the p-Si surface and employing p-doped hole transport layer to enhance holes injection, these OLEDs show comparable or even better performance to conventional OLEDs which use ITO as anodes. The present technique has the advantage of less masking steps in making AMOLED.