Cart (Loading....) | Create Account
Close category search window

Open circuit voltage improvement of high-deposition-rate microcrystalline silicon solar cells by hot wire interface layers

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Mai, Y. ; IPV, Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany ; Klein, S. ; Carius, R. ; Stiebig, H.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Significant improvement in open circuit voltage and fill factor was achieved for microcrystalline silicon c-Si:H) solar cells deposited by plasma-enhanced chemical vapor deposition (PECVD) by the incorporation of an intrinsic μc-Si:H p/i buffer layer fabricated by hot-wire (HW) CVD. The improved p/i interface quality, likely due to the ion-free deposition on the p layers in the HWCVD process, was concluded from a considerably enhanced blue light response in such solar cells. Using this buffer layer concept allows the authors to apply high deposition rate PECVD processes for the μc-Si:H i layer material, yielding a high efficiency of 10.3% for a single junction μc-Si:H solar cell.

Published in:

Applied Physics Letters  (Volume:87 ,  Issue: 7 )

Date of Publication:

Aug 2005

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.