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Pseudospark electron beam as an excitation source for extreme ultraviolet generation

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4 Author(s)
Chunqi Jiang ; Department of Electrical Engineering-Electrophysics, University of Southern California, Los Angeles, California 90089-0271 ; Kuthi, A. ; Gundersen, M.A. ; Hartmann, W.

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A xenon pseudospark device is used to generate energetic and intense electron beams (e-beams) that induce extreme ultraviolet (EUV) emission in the range of 11–17 nm. This e-beam-based EUV source is compact, and the device is of interest because it has potentially attractive EUV conversion efficiency and pulse energy requirement, with potential for long lifetime and high repetition-rate operation. The role of e-beam-induced inelastic electronic collisions is considered.

Published in:

Applied Physics Letters  (Volume:87 ,  Issue: 13 )