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Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors

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4 Author(s)
Xiaojin Zhao ; Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon ; Farid Boussaid ; Amine Bermak ; Vladimir G. Chigrinov

We fabricated and characterized a thin photo-patterned micropolarizer array for complementary metal-oxide-semiconductor (CMOS) image sensors. The proposed micropolarizer fabrication technology completely removes the need for complex selective etching. Instead, it uses the well-controlled process of ultraviolet photolithography to define micropolarizer orientation patterns on a spin-coated azo-dye-1 film. The patterned polymer film micropolarizer (10 mum x 10 mum) exhibits submicron thickness (0.3 mum) and has an extinction ratio of ~ 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.

Published in:

IEEE Photonics Technology Letters  (Volume:21 ,  Issue: 12 )