By Topic

Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Atuchin, V.V. ; Lab. of Opt. Mater. & Struct., SB RAS, Novosibirsk ; Aliev, V.Sh. ; Kruchinin, V.N. ; Ramana, C.V.

ZrO2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO2/Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optical properties of the film were studied by spectroscopic ellipsometry over the spectral range 250-900 nm.

Published in:

Strategic Technology, 2007. IFOST 2007. International Forum on

Date of Conference:

3-6 Oct. 2007