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Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature

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4 Author(s)
Atuchin, V.V. ; Lab. of Opt. Mater. & Struct., SB RAS, Novosibirsk ; Aliev, V.Sh. ; Kruchinin, V.N. ; Ramana, C.V.

ZrO2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO2/Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optical properties of the film were studied by spectroscopic ellipsometry over the spectral range 250-900 nm.

Published in:

Strategic Technology, 2007. IFOST 2007. International Forum on

Date of Conference:

3-6 Oct. 2007

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