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Time-Dependent Dielectric Breakdown of \hbox {La}_{2} \hbox {O}_{3} -Doped High- k /Metal Gate Stacked NMOSFETs

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13 Author(s)
In-Shik Han ; Dept. of Electron. Eng., Chungnam Nat. Univ., Daejeon ; Won-Ho Choi ; Hyuk-Min Kwon ; Min-Ki Na
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Time-dependent dielectric breakdown (TDDB) characteristics of La2O3-doped high-k dielectric in Hf-based high-k/TaN metal gate stack were studied. Unlike the abrupt breakdown in the conventional SiO2 , dielectric breakdown behaviors of La-incorporated HfON and HfSiON dielectrics show progressive breakdown characteristics. Moreover, the extracted Weibull slope beta of breakdown distribution is in the range of 0.87-1.19, and it is independent on capacitor areas and stress conditions. Moreover, field dependence of TBD and stress-induced leakage current strongly suggest that the E-model is more applicable to explain in TDDB of La-incorporated high-k dielectric in Hf-based high-k/metal gate stack structure.

Published in:

Electron Device Letters, IEEE  (Volume:30 ,  Issue: 3 )