By Topic

Advanced Lithography for Bit Patterned Media

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Yang, XiaoMin ; Seagate Res., Pittsburgh, PA ; Xu, Yuan ; Lee, Kim ; Xiao, Shuaigang
more authors

For bit patterned media (BPM) applications, while significant progress has recently been made in demonstrating high-resolution dot patterning using e-beam direct writing, and followed by the successful imprint process, many serious issues in fabrication still remain. This paper will only discuss the key challenges in the BPM lithography, including (1) the commercial availability of a high-resolution rotating stage e-beam system; (2) the approach and limitation of directed polymer self-assembly for resist pattern quality improvement and resolution enhancement; (3) the difficulties and limitations in the fabrication and replication of a 1 times template with a density beyond 1 Tbit per square inch (Tb/in2), while the defectivity, lifetime, and damage of the template are still questionable; (4) the tight requirements of size uniformity and placement accuracy; and (5) the needs of advanced metrology associated with the very small dot size and defect characterization. In this paper, we will address the above challenges and present some experimental data along with possible solutions for the challenges.

Published in:

Magnetics, IEEE Transactions on  (Volume:45 ,  Issue: 2 )