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Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition

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7 Author(s)
Chun Huang ; Dept. of Chem. Eng. & Mater. Sci., Yuan Ze Univ., Chungli ; Wen-Tung Hsu ; Chi-Hung Liu ; Shin-Yi Wu
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A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure-plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40degC-80degC, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamber less deposition for coating application.

Published in:

IEEE Transactions on Plasma Science  (Volume:37 ,  Issue: 7 )