Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition

A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure-plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40degC-80degC, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamber less deposition for coating application.