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Hydrogenated Amorphous Carbon Films Prepared by Plasma-enhanced Chemical Vapor Deposition

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4 Author(s)
Huran, J. ; Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava ; Kobzev, A.P. ; Balalykin, N.I. ; Pezoltd, J.

A capacitively coupled plasma reactor was used for PECVD technology, where methane was introduced into the plasma reactor through the shower head. The concentration of species in the a-C:H films were determined by RBS and ERD method. The RBS results showed the main concentrations of C in the films. The concentration of hydrogen was approximately 20 at.%. The films contain a small amount of oxygen and nitrogen. Chemical compositions were analyzed by IR spectroscopy. IR results showed the presence of C-H specific bonds.

Published in:

Advanced Semiconductor Devices and Microsystems, 2008. ASDAM 2008. International Conference on

Date of Conference:

12-16 Oct. 2008

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