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An optical field-induced ionization X-ray laser using a preformed plasma scheme

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5 Author(s)
Midorikawa, K. ; RIKEN, Inst. of Phys. & Chem. Res., Saitama, Japan ; Nagata, Y. ; Kubodera, S. ; Obara, Minoru
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Soft X-ray amplification by optical field-induced ionization (OFI) of a preformed plasma is investigated. A small-signal gain of 20 cm-1 and a gain-length product of 4 at 13.5 nm on the Lyman-α transition in hydrogen-like lithium have been obtained using the modified OFI scheme. Experimental and numerical results ensure that we have produced a plasma with a significantly lower electron temperature than what is expected by an above-threshold ionization model. To explain the results, a two component plasma model in which relatively high temperature electrons are produced by OFI in a cold electron bath of the preformed plasma is presented. The model indicates that the average electron temperature of the OFI plasma rapidly decreases since a high-temperature part of the electrons escapes from the focal volume without interaction. The initial electrons produced prior to the field ionization, which survive after the OEI, also significantly contribute to the rapid three-body recombination. Based on the ionization-induced refractive index change, the pulse propagation of a high-intensity pump laser during the OFI is also discussed

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Selected Topics in Quantum Electronics, IEEE Journal of  (Volume:1 ,  Issue: 3 )