By Topic

Frequency effects in capacitively coupled radio-frequency glow discharges: a comparison between a 2-D fluid model and experiments

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Goedheer, W.J. ; FOM Inst. for Plasma Phys., Nieuwegein ; Meijer, P.M. ; Bezemer, J. ; van Sark, W.G.J.H.M.

The results of a 2-D fluid model for argon radiofrequency (RF) discharges in a closed cylindrical vacuum chamber are compared with experimental data from an amorphous silicon deposition reactor operated in argon. Good agreement is obtained for the relation between the DC autobias voltage and the dissipated power in the frequency range 40-100 MHz at pressures between 10 and 60 Pa. Scaling laws are presented for the dissipated power and for the ion fluxes toward the electrodes. These quantities are expressed in the DC bias voltage, the RF excitation frequency and the background pressure. Also the uniformity of the ion fluxes is studied. The model yields a linear relation between the applied RF voltage and the DC bias voltage. This relation depends only on the geometry of the discharge chamber and shows an offset

Published in:

Plasma Science, IEEE Transactions on  (Volume:23 ,  Issue: 4 )