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Understanding and engineering of carrier transport in advanced MOS channels

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1 Author(s)
Shinichi Takagi ; School of Engineering, The University of Tokyo, Japan

Mobility enhancement technologies have currently been recognized as mandatory for future scaled MOSFETs. In this paper, we review the basic concept on the choice of channel materials for high performance MOSFETs and address several important issues on carrier transport properties of mobility-enhanced CMOSFETs, including the effects of uniaxial strain on Si n-MOSFETs and the critical issues on Ge/III-V MOSFETs.

Published in:

2008 International Conference on Simulation of Semiconductor Processes and Devices

Date of Conference:

9-11 Sept. 2008