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Influence of the preoxidation cleaning on the electrical properties of thin SIO2 layers

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4 Author(s)
Prom, J.L. ; Centre National de la Recherche Scientifique, Laboratoire d''Automatique et d''Analyse des Systÿmes, Toulouse, France ; Castagne, J. ; Sarrabayrouse, G. ; Munoz-Yague, A.

The influence of a preoxidation cleaning procedure including an (HF + ethanol) step is investigated. It is shown that such a treatment gives a better thickness uniformity and improves the breakdown strength of silica layers.

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Solid-State and Electron Devices, IEE Proceedings I  (Volume:135 ,  Issue: 1 )