Cart (Loading....) | Create Account
Close category search window
 

Determination of Work Functions in the \hbox {Ta}_{1 - x}\hbox {Al}_{x}\hbox {N}_{y}/\hbox {HfO}_{2} Advanced Gate Stack Using Combinatorial Methodology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Kao-Shuo Chang ; Nat. Inst. of Stand. & Technol., Gaithersburg, MD ; Green, Martin L. ; Hattrick-Simpers, J.R. ; Takeuchi, Ichiro
more authors

Combinatorial methodology enables the generation of comprehensive and consistent data sets, compared with the ldquoone-composition-at-a-timerdquo approach. We demonstrate, for the first time, the combinatorial methodology applied to the work function (Phim) extraction for Ta1-xAlxNy alloys as metal gates on HfO2, for complementary metal-oxide-semiconductor applications, by automated measurement of over 2000 capacitor devices. Scanning X-ray microdiffraction indicates that a solid solution exists for the Ta1-xAlxNy libraries for 0.05 les x les 0.50. The equivalent oxide thickness maps offer a snapshot of gate stack thermal stability, which show that Ta1-xAlxNy alloys are stable up to 950degC . The Phim of the Ta1-xAlxNy libraries can be tuned as a function of gate metal composition over a wide (0.05 les x les 0.50) composition range, as well as by annealing. We suggest that Ta0.9Al0.1N1.24 gate metal electrodes may be useful for p-channel metal-oxide-semiconductor applications.

Published in:

Electron Devices, IEEE Transactions on  (Volume:55 ,  Issue: 10 )

Date of Publication:

Oct. 2008

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.