Referenced Items are not available for this document.
We have reported periodic pore formation with diameter in 80 nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.
Published in:
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Date of Conference: 21-26 May 2006
- Page(s):
- 1 - 2
- E-ISBN :
- 978-1-55752-813-1
- Print ISBN:
- 978-1-55752-813-1
- INSPEC Accession Number:
- 10354763
- Conference Location :
- Long Beach, CA
- Digital Object Identifier :
- 10.1109/CLEO.2006.4628638
- Product Type:
- Conference Publications
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