We report the development and application of a novel scanning probe array that consists of "blunt" and "sharp" tips with precisely defined contact areas. A new micromachining process based on SOI (silicon-on-insulator) substrates has been successfully developed to enable the fabrication of the scanning probe array. To demonstrate its capability for variable-resolution scanning probe lithography, the scanning probe array has been used to simultaneously generate fluorescent patterns with different linewidths in a parallel mode.
Published in:
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Date of Conference: 18-21 Aug. 2008