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In this paper, the structural and optical properties of these prepared films are sputtered by direct current (dc) powers without/with the ion-assisted deposition (IAD) technique. The optimal four-layer structure with anti-reflection (AR) coating films, which grown at 80degC temperature, 15-cm distance between target and substrate, 55-sccm oxygen flow and 1250-W magnetron sputtering power with the IAD technique, is used to study the optical performance. By using atomic force microscope (AFM) to identify the surface of the sputtered Nb2O5 films, we found that films' roughness is 0.185 nm. In the glass substrate with SiO2/Nb2O5 multilayer, the peak transmittances measured at visible range are 95.89% and 93.40%, respectively coating with/without the IAD-sputtering technology. These results are better than those that is measured with a bare hardness poly-carbonate (HPC) (91.25%) and improved well above the flexible liquid crystal display (LCD) application standard.
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Date of Conference: 18-21 Aug. 2008