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Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology

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2 Author(s)
Jun Song ; Centre for Opt. & Electromagn. Res., Zhejiang Univ., Hangzhou ; Zhu, Ning

Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by alpha-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 nm spacing for both echelle and total-internal-reflection (TIR) facets have been fabricated and characterized.

Published in:

Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on

Date of Conference:

11-14 Aug. 2008