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Power Deposition Profiles in Magnetized Inductively Coupled Plasma

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4 Author(s)
Ho-Jun Lee ; Dept. of Electr. Eng., Pusan Nat. Univ., Pusan ; Hae June Lee ; Wang Sun Lim ; Whang, Ki-Woong

Power deposition profiles and spatial distributions of electron density and temperature of magnetized inductively coupled argon plasma are visualized using self-consistent fluid simulation. The model uses Ampere's law with anisotropic conductivity, particle, and energy conservation equation with anisotropic transport coefficient. Spatial distribution of power absorption shows clear development of cavity mode of low-frequency R wave. More uniform density distribution is found in magnetized discharge than in ordinary inductively coupled discharge. The effects of nonuniform electron density and magnetic flux density are shown.

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Plasma Science, IEEE Transactions on  (Volume:36 ,  Issue: 4 )