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Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( a -C:F) on Spherical Surfaces

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2 Author(s)
Costel Biloiu ; Varian Semicond. Equip. Assoc., Gloucester, MA ; Yosuke Sakai

An RF capacitively coupled reactor designed for plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films on spherical surfaces is described. Pictures of the plasma created between the concentrically spherical electrodes, the film surface, and a cross section of the film are presented.

Published in:

IEEE Transactions on Plasma Science  (Volume:36 ,  Issue: 4 )