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Future of silicon integrated circuit technology

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1 Author(s)
Iwai, H. ; Frontier Collaborative Res. Center, Tokyo Inst. of Technol., Yokohama

CMOS technology has been developed into the sub-100 nm range. It is expected that the nano-CMOS technology will governed the IC manufacturing for at least another couple of decades. Though there are many challenges ahead, further down-sizing the device to a few nanometers is still on the schedule of International Technology Roadmap for Semiconductors (ITRS). Several technological options for manufacturing nano-CMOS microchips have been available or will soon be available. This paper reviews the challenges of nano-CMOS downsizing and manufacturing. We shall focus on the recent progress on the key technologies for the nano-CMOS IC fabrication in the next fifteen years.

Published in:

Industrial and Information Systems, 2007. ICIIS 2007. International Conference on

Date of Conference:

9-11 Aug. 2007