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Uniform Square Polycrystalline Silicon Fabricated by Employing Periodic Metallic Pads and SiON Absorption Layer for Thin Film Transistors

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8 Author(s)
Po-Chuan Yang ; Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei ; Chun-Yuan Hsueh ; Chieh-Hung Yang ; Jeng-Han Lee
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The poly crystalline silicon with regular square grains is fabricated by employing metallic (Cr/Al) periodic pads as the heat sinks and with underlying silicon oxynitride (SiON) as the heat absorption layer. The maximum lateral growth length of the poly-Si is 1.78 mum by this method. If the metal pads are periodically arranged, the poly-Si can grow to regular square grains following the high power excimer laser annealing. After removing the metallic pads, the low power laser shot transfers the a-Si:H under the original metallic pads to poly-Si without destroying the square grains. The TFTs fabricated by this method achieve a field effect mobility of 450 cm2/Vmiddots and an on/off current ratio exceeding 107. It is found that the TFT with smaller channel width and length results in a better subthreshold swing because it contains fewer grain boundaries and defects.

Published in:

IEEE Transactions on Electron Devices  (Volume:55 ,  Issue: 8 )