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Fabrication of nanophotonic circuit components by thermal nano imprint lithography

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8 Author(s)
Stijn Scheerlinck ; Photonics Research Group, IMEC - Ghent University, Sint-Pietersnieuwstraat 41, 9000 Gent, Belgium ; Rasmus Haugstrup Pedersen ; Pieter Dumon ; Wim Bogaerts
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Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.

Published in:

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Date of Conference:

4-9 May 2008