Amorphous Cores Produced by High Rate Sputtering

In attempts to obtain new amorphous materials for use in magnetic cores, high-rate magnetron sputtering was used to grow Co-Zr-Mo-Ni amorphous films on glass substrates, which were annealed at temperatures above the Curie point T
c
but below the crystallization temperature T
x
. Although the annealing was effective in reducing the anisotropy, it did not totally eliminate it. Ring cores with excellent frequency characteristics were also obtained.